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This topic has been translated from a Chinese forum by GPT and might contain errors.Original topic: ALTER 创建tiflash副本报错
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username: xiaoxiaozuofang
【TiDB Usage Environment】Production Environment / Testing / PoC
【TiDB Version】
【Reproduction Path】What operations were performed when the issue occurred
【Encountered Issue:】
【Resource Configuration】
【Attachments: Screenshots / Logs / Monitoring】
Placement and TiFlash cannot be set simultaneously, as it causes a conflict.
In TiDB, Placement refers to the deployment strategy of TiKV and TiFlash nodes in a distributed cluster, used to specify the storage location and number of replicas of data. Typically, Placement can only be set on TiKV nodes, while TiFlash nodes automatically manage Placement.
When both Placement and TiFlash replica options are set simultaneously in TiDB, the error “Placement and tiflash replica options cannot be set at the same time” will occur. This is because TiFlash replica options are used to specify the number of replicas and distribution strategy for TiFlash nodes, and the replicas of TiFlash and Placement are different concepts that cannot be set at the same time. If you need to set TiFlash replica options in TiDB, you should first set Placement to its default value and then set the TiFlash replica options.
In earlier versions, TiFlash’s isolation also used placement, and the two could not be used simultaneously, otherwise there would be a conflict. I don’t know if the latest version has resolved this issue; you can test it out.
Starting from version 6.3, it supports setting both placement and TiFlash simultaneously.
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